期刊全名
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
最新影响因子
2.1年均收录文章
241期刊简称
J VAC SCI TECHNOL A来源地区
UNITED STATES详细类别
MATERIALS SCIENCE
COATINGS & FILMS材料科学：膜
3区
PHYSICS
APPLIED物理：应用
3区
中科院杂志分区
工程技术(3区)是否OA开放访问
No投稿难度
容易出版周期
Bimonthly投稿链接
点击投稿杂志主页
点击查看杂志主页自引率
15.40%类别
工程技术-材料科学：膜coverage
Science Citation Index审稿周期
一般,3-6周JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A是一本专注于真空科学与技术领域的学术期刊，ISSN号为0734-2101，由美国物理联合会（AIP Publishing）出版，出版地为美国，出版周期为双月刊。该期刊的影响因子根据年份有所不同，最新数据需查询官方来源，它被SCI收录，属于中科院分区中的工程技术类期刊，具体分区需参考当年中科院分区表，该期刊为非开放获取（非OA）期刊。其发文特点主要涵盖真空科学、表面科学、薄膜技术、等离子体技术、材料加工等领域，尤其关注实验与理论研究的结合。杂志的质量较高，在相关领域具有一定影响力，但投稿竞争较激烈，审稿周期可能较长，需注意研究内容的创新性和技术深度以提升录用概率。
Considerations for implementing real-time machine learning tools to evaluate ToF-SIMS data
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Essential principles and practices in x-ray photoelectron spectroscopy
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Structure evolution and properties of Ni films deposited by RF magnetron sputtering with and without H2-assistance
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Wafer-scale high-
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SrTiO3 dielectrics with rational barrier-layer design for low leakage and high charge density
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Bi surfactant-driven surface smoothing in InSb(100) epitaxy across extended growth temperatures
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Early nitridation and oxynitridation stages of hafnium-adsorbed Si(111) surfaces using supersonic nitrogen and nitric oxide molecular beams
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Cr2O3/β-Ga2O3 heterojunction diodes on thick, mid-1015 cm−3 low-doped drift layer with 3.45 kV breakdown voltage
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Impedance match timing for pulsed RF control: Global model and validation experiments
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Metrology of ultrathin iron catalyst films by spectroscopic ellipsometry
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Electronegativity as a selectivity descriptor for the adsorption of small molecule inhibitors during area-selective deposition
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Single phase, epitaxial high-entropy (Mg,Ca,Co,Ni,Zn)O thin films by pulsed laser deposition
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Thick, low doped (001) gallium oxide drift layers at 100 mm via halide vapor phase epitaxy
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Effect of Si or Mg co-doping on the thermally stimulated conductivity of β-Ga2O3: Mn ceramics in the temperature range 100–500 K
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NiO/Ga2O3 heterojunction rectifiers with &gt;8.1 kV breakdown enabled by optimized field plate configuration
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Plasma enhanced oxygen and hydrogen evolution reaction efficiency of titanium vanadate thin film electrodes fabricated by RF magnetron sputtering for green hydrogen production
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N-polar binary GaN/AlN single-crystal high-electron-mobility transistor structures on bulk AlN substrates by molecular beam epitaxy
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Effect of microarc oxidation/diamondlike carbon composite coating on wear resistance, friction reduction, and corrosion resistance of 6061 aluminum alloy
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